- PII
- 10.31857/S0023476123020212-1
- DOI
- 10.31857/S0023476123020212
- Publication type
- Status
- Published
- Authors
- Volume/ Edition
- Volume 68 / Issue number 2
- Pages
- 180-188
- Abstract
- The results of studying the specific features of the growth of zinc oxide films formed on sapphire substrates by magnetron sputtering in an inhomogeneous electric field are presented. The films have been analyzed by high-resolution X-ray diffractometry, pole figure technique, and electron microscopy. A sequence of changes in the lateral structure with an increase in the film thickness, which depends also on the local potential, is revealed. Thus, regions with a higher surface potential correspond to the ZnOá10 0ñ(0001)||Al2O3á11 0ñ(0001) epitaxial ratio with the least lattice mismatch.
- Keywords
- X-RAY DIFFRACTOMETRY ZnO EPITAXIAL FILMS MAGNETRON SPUTTERING
- Date of publication
- 15.09.2025
- Year of publication
- 2025
- Number of purchasers
- 0
- Views
- 12
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