RAS PhysicsКристаллография Crystallography Reports

  • ISSN (Print) 0023-4761
  • ISSN (Online) 3034-5510

X-RAY DIAGNOSTICS OF MULTILAYER Ti/Ni MIRRORS WITH VARIOUS CONFIGURATIONS OF Si BUFFER INSERTS USING X-RAY REFLECTOMETRY AND STANDING X-RAY WAVES METHODS

PII
S3034551025060022-1
DOI
10.7868/S3034551025060022
Publication type
Article
Status
Published
Authors
Volume/ Edition
Volume 70 / Issue number 6
Pages
905-911
Abstract
This article investigates the periodic structure of Ni/Ti X-ray mirrors with different configurations of Si buffer layers using X-ray reflectometry and standing X-ray wave techniques. Depth profiles of electron density and the distributions of Ni and Ti elements within the films were obtained. Films with period structures of Ti/Ni, Ti/Si/Ni, Ti/Ni/Si, and Ti/Si/Ni/Si were examined. The results show that the structure featuring a Si buffer layer inserted both between layers within a period and between the periods themselves (Ti/Si/Ni/Si) is optimal as a mirror configuration in terms of reflectometry intensity.
Keywords
Date of publication
09.09.2025
Year of publication
2025
Number of purchasers
0
Views
3

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